1303.1353 (Wei Li et al.)

Highly reproducible metal/graphene contacts and stable electrical
performance by UV-Ozone treatment    [PDF]

Wei Li, Christina A. Hacker, Yiran Liang, Curt A. Richter, David J. Gundlach, Xuelei Liang, Lianmao Peng

Resist residue from the device fabrication process is a general and significant source of the metal/graphene contact interface contamination. In this paper, Ultraviolet-Ozone (UVO) treatment is proven to be an effective way of cleaning the metal/graphene interface. Electrical measurements of devices, which were fabricated by using UVO treatment of the metal/graphene contact region, show that stable and highly reproducible low contact resistance between metal and graphene is obtained without affecting the electrical properties of the graphene channel itself.

View original: http://arxiv.org/abs/1303.1353