Wednesday, November 28, 2012

1211.6202 (Q. Wu et al.)

Selective surface functionalization at regions of high local curvature
in graphene

Q. Wu, Y. Wu, Y. Hao, J. Geng, M. Charlton, S. Chen, Y. Ren, H. Ji, H. Li, D. W. Boukhvalov, R. D. Piner, C. W. Bielawski, R. S. Ruoff
Monolayer graphene was deposited on a Si wafer substrate decorated with SiO2 nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.
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