Tuesday, October 23, 2012

1210.5808 (Wenhong Wang et al.)

Fabrication and characterization of the gapless half-Heusler YPtSb thin
films
   [PDF]

Wenhong Wang, Yin Du, Enke Liu, Zhongyuan Liu, Guangheng Wu
Half-Heusler YPtSb thin films were fabricated by magnetron co-sputtering method on MgO-buffered SiO2/Si(001) substrates. X-ray diffraction pattern and Energy dispersive X-ray spectroscopy confirmed the high-quality growth and stoichiometry. The temperature dependence of the resistivity shows a semiconducting-type behavior down to low temperature. The Hall mobility was determined to be 450 cm2/Vs at 300K, which is much higher than the bulk value (300 cm2/Vs). In-plane magnetoresistance (MR) measurements with fields applied along and perpendicular to the current direction show opposite MR signs, which suggests the possible existence of the topological surface states.
View original: http://arxiv.org/abs/1210.5808

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