Hema C. P. Movva, Michael E. Ramón, Chris M. Corbet, Sushant Sonde, Sk. Fahad Chowdhury, Gary Carpenter, Emanuel Tutuc, Sanjay K. Banerjee
We report a method of fabricating self-aligned, top-gated graphene field-effect transistors (GFETs) employing polyethyleneimine spin-on-doped source/drain access regions, resulting in a 2X reduction of access resistance and a 2.5X improvement in device electrical characteristics, over undoped devices. The GFETs on Si/SiO$_2$ substrates have high carrier mobilities of up to 6,300 cm$^2$/Vs. Self-aligned spin-on-doping is applicable to GFETs on arbitrary substrates, as demonstrated by a 3X enhancement in performance for GFETs on insulating quartz substrates, which are better suited for RF applications.
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http://arxiv.org/abs/1210.5535
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