Wednesday, July 4, 2012

1207.0314 (B. Kundys et al.)

Light controlled magnetoresistance and magnetic field controlled
photoresistance in CoFe film deposited on BiFeO3
   [PDF]

B. Kundys, C. Meny, M. R. J. Gibbs, V. Da Costa, M. Viret, M. Acosta, D. Colson, B. Doudin
We present a magnetoresistive-photoresistive device based on the interaction of a piezomagnetic CoFe thin film with a photostrictive BiFeO3 substrate that undergoes light-induced strain. The magnitude of the resistance and magnetoresistance in the CoFe film can be controlled by the wavelength of the incident light on the BiFeO3. Moreover, a light-induced decrease in anisotropic magnetoresistance is detected due to an additional magnetoelastic contribution to magnetic anisotropy of the CoFe film. This effect may find applications in photo-sensing systems, wavelength detectors and can possibly open a research development in light-controlled magnetic switching properties for next generation magnetoresistive memory devices.
View original: http://arxiv.org/abs/1207.0314

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