1112.1292 (M. -H. Hu et al.)

Investigation of the thermal stability of Mg/Co periodic multilayers for
EUV applications    [PDF]

M. -H. Hu, K. Le Guen, Jean-Michel André, S. -K. Zhou, H. -C. Li, J. -T. Zhu, Z. -S. Wang, C. Meny, N. Mahne, Angela Giglia, S. Nannarone, I. Esteve, M. Walls, Philippe Jonnard

We present the results of the characterization of Mg/Co periodic multilayers
and their thermal stability for the EUV range. The annealing study is performed
up to a temperature of 400\degree C. Images obtained by scanning transmission
electron microscopy and electron energy loss spectroscopy clearly show the good
quality of the multilayer structure. The measurements of the EUV reflectivity
around 25 nm (~49 eV) indicate that the reflectivity decreases when the
annealing temperature increases above 300\degreeC. X-ray emission spectroscopy
is performed to determine the chemical state of the Mg atoms within the Mg/Co
multilayer. Nuclear magnetic resonance used to determine the chemical state of
the Co atoms and scanning electron microscopy images of cross sections of the
Mg/Co multilayers reveal changes in the morphology of the stack from an
annealing temperature of 305\degreee;C. This explains the observed reflectivity
loss.

View original: http://arxiv.org/abs/1112.1292