1302.3397 (S. Schreyeck et al.)

Molecular beam epitaxy of high structural quality Bi2Se3 on lattice
matched InP(111) substrates    [PDF]

S. Schreyeck, N. V. Tarakina, G. Karczewski, C. Schumacher, T. Borzenko, C. Bruene, H. Buhmann, C. Gould, K. Brunner, L. W. Molenkamp

Epitaxial layers of the topological insulator Bi2Se3 have been grown by molecular beam epitaxy on laterally lattice-matched InP(111)B substrates. High resolution X-ray diffraction shows a significant improvement of Bi2Se3 crystal quality compared to layers deposited on other substrates. The measured full width at half maximum of the rocking curve is Delta omega=13 arcsec, and the (omega-2theta) scans exhibit clear layer thickness fringes. Atomic force microscope images show triangular twin domains with sizes increasing with layer thickness. The structural quality of the domains is confirmed on the microscopic level by transmission electron microscopy.

View original: http://arxiv.org/abs/1302.3397